Stress Characterization of Si by Near-Field Raman Microscope Using Resonant Scattering

Author： Yoshikawa Masanobu Murakami Masataka

Publisher： Society for Applied Spectroscopy

ISSN： 0003-7028

Source： Applied Spectroscopy, Vol.60, Iss.5, 2006-05, pp. : 479-482

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