Fine-line plasma-enhanced processes on the basis of a set of pilot units with a scalable inductively coupled plasma source for use in microelectronics

Author： Orlikovsky A.   Rudenko K.   Averkin S.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 0018-1439

Source： High Energy Chemistry, Vol.40, Iss.3, 2006-05, pp. : 182-193

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