Deposition of Al2O3 and SiO2 Films via Pyrolysis of Aluminum Acetylacetonate and Hexamethyldisiloxane in the Presence of Nitrogen Compounds

Author: Mittov O.N.   Ponomareva N.I.   Mittova I.Y.   Novikova E.D.   Gadebskaya T.A.   Bezryadin M.N.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0020-1685

Source: Inorganic Materials, Vol.36, Iss.12, 2000-12, pp. : 1243-1250

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Abstract