Author： Zilberman B. Makarychev-Mikhailov M. Ryabkov D. Saprykin V. Toropilov I. Guzyuk N.
Publisher： MAIK Nauka/Interperiodica
ISSN： 0040-5795
Source： Theoretical Foundations of Chemical Engineering, Vol.45, Iss.4, 2011-08, pp. : 530-536
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Abstract
Equilibrium data on the liquid-vapor distribution for HNO3-H2O, HNO3-HF-H2O, HNO3-CH3COOH-H2O, and HNO3-HCl-H2O are given. Equations for the calculation of the acid distribution coefficients in the first three systems have been obtained and a mathematic model for nitric acid rectification containing the impurities has been derived, excluding the case of azeotropic rectification. The model could not be applied to the process based on ox-red reactions such as in the HCl-HNO3 system. The HNO3 liquid-vapor distribution during uninterrupted evaporation in the apparatus with bottom circulation is in equilibrium, while that in direct-flow evaporators with ascending and descending flows is characterized by a significantly higher distribution coefficient because of the linear evaporation effect.
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