A comprehensive mathematical model to calculate polish time for oxide chemical mechanical process (CMP)

Author: Kumar S.   Garg T.K.   Wani V.P.  

Publisher: Inderscience Publishers

ISSN: 1368-2148

Source: International Journal of Manufacturing Technology and Management, Vol.22, Iss.2, 2011-02, pp. : 145-159

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content