Arsenic incorporation and doping behaviour in silicon and SiGe epitaxial layers grown by gas source molecular beam epitaxy

Author: Fernández J. M.   Xie M. H.   Matsumura A.   Mokler S. M.   Zhang J.   Joyce B. A.  

Publisher: Maney Publishing

ISSN: 1743-2847

Source: Materials Science and Technology, Vol.11, Iss.4, 1995-04, pp. : 396-399

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content