Modelling plasma etching of AI thin films using neural network

Author: Kim B.   Park K. Y.   Han D.  

Publisher: Maney Publishing

ISSN: 1743-2944

Source: Surface Engineering, Vol.20, Iss.6, 2004-12, pp. : 454-458

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract