![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Furze D. C. Eyre T. S.
Publisher: Maney Publishing
ISSN: 1743-2944
Source: Surface Engineering, Vol.4, Iss.3, 1988-01, pp. : 227-232
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Materials Science and Technology, Vol. 19, Iss. 9, 2003-09 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Ion implantation doping of semiconductors
By Sealy B. J.
Materials Science and Technology, Vol. 4, Iss. 6, 1988-06 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Surface modification by plasma ion and ion beam implantation
By Husein I. F. Zhou Y. Qin S. Chan C.
Surface Engineering, Vol. 13, Iss. 1, 1997-01 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
By Astakhov Viktor Galitsky Vasily
The International Journal of Advanced Manufacturing Technology, Vol. 36, Iss. 9-10, 2008-04 ,pp. :