Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films

Author： Bornholdt S   Itagaki N   Kuwahara K   Wulff H   Shiratani M   Kersten H  

Publisher： IOP Publishing

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.22, Iss.2, 2013-04, pp. : 25019-25026

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Reactive magnetron sputter deposition of (Ti,Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate

By Rahmati A.  

Physica Scripta, Vol. 86, Iss. 2, 2012-08 ,pp. : 25301-25310

IOP Publishing

Access to resources Recommend Favorite

Effect of annealing on ZnO thin films grown on quartz substrate by RF magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 365, Iss. 1, 2012-05 ,pp. : 150-154

IOP Publishing

Access to resources Recommend Favorite

Surface characterization of ZnO transparent thin films

By  

Journal of Physics: Conference Series , Vol. 10, Iss. 1, 2005-01 ,pp. : 147-150

IOP Publishing

Access to resources Recommend Favorite

V-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering

By Shao W. D.   Chen X. F.   Ren W.   Shi P.   Wu X. Q.   Tan O. K.   Zhu W. G.   Yao X.  

Ferroelectrics, Vol. 406, Iss. 1, 2010-01 ,pp. : 10-15

Taylor & Francis Ltd

Access to resources Recommend Favorite

Growth evolution of ZnO thin films deposited by RF magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 370, Iss. 1, 2012-06 ,pp. : 160-166

IOP Publishing

Access to resources Recommend Favorite