Unveiling the Composition of Sulfur Sensitization Specks by their Interaction with TAI

Author: Charlier E.   Van Doorselaer M.   Gijbels R.   De Keyzer R.   Geuens I.  

Publisher: Society for Imaging Science and Technology

ISSN: 1943-3522

Source: Journal of Imaging Science and Technology, Vol.44, Iss.3, 2000-05, pp. : 235-241

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content