Physical Properties of Titanium Oxide Thin Films Prepared by DC Magnetron Sputtering: Influence Substrate Temperature and O2/Ar in the Gas Mixture

Author: Hantehzadeh M.   Amouha M.   Solaymani S.   Osati T.   Ghobadi B.  

Publisher: Springer Publishing Company

ISSN: 0164-0313

Source: Journal of Fusion Energy, Vol.32, Iss.6, 2013-12, pp. : 622-626

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract