Effect of silicon ion implantation on the properties of a cast Co–Cr–Mo alloy

Author： Kaminski M. Baszkiewicz J. Kozubowski J. Bednarska A. Barcz A. Gawlik G. Jagielski J.

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.32, Iss.14, 1997-12, pp. : 3727-3732

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Abstract

The effect of silicon ion implantation upon the corrosion resistance and structure of the cast Co–Cr–Mo alloy of the Vitalium type, was examined. The silicon fluences were 1.5, 3.0 and 4.5×1017Si+ cm-2. The surface layer of the Vitalium samples implanted with these silicon doses was found to become amorphous. Further annealing of the samples at 200 °C resulted in the Cr3Co5Si2 phase being formed, whereas the amorphous layer was preserved. The Vitalium samples submerged in the 0.9% NaCl solution underwent mainly uniform corrosion, irrespective of whether or not they had been implanted with Si+ ions. With increasing doses of implanted silicon and after annealing at 200 °C (samples implanted with 1.5×1017Si+ cm-2), the corrosion resistance increased. The thickness of the oxide layer formed during the anodic polarization depended on the implanted silicon doses.