The effect of He or Ar/O₂ plasma treatment on Si surface prior to chemical vapor deposition of SiO₂

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Journal of Materials Science: Materials in Electronics, Vol. 15, Iss. 1, 2004-01 ,pp. : 37-41

Springer Publishing Company

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Electrical properties of R₂O–Al₂O₃–SiO₂ glass–ceramics for anodic bonding

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Low-temperature sintering of SiC reticulated porous ceramics with MgO–Al₂O₃–SiO₂ additives as sintering aids

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The effect of rare-earth oxides on the crystallization of CaO–Al2O3–SiO2 glasses

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Effect of SiO2 binder on the precipitation state of an AlCu4Mg1Ag/Saffil composite

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