Formation of C54 TiSi2 thin films by using high-temperature sputtering and rapid thermal annealing

Author: Lee S. J.   Kim D. Y.   Kim T. W.  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.39, Iss.9, 2004-05, pp. : 3203-3205

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