Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content

Author: Bouridah H.   Mansour F.   Mahamdi R.   Temple-Boyer P.  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.40, Iss.6, 2005-03, pp. : 1405-1408

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content