Effect of plasma treatment on the microstructure and electrical properties of MIM capacitors with PECVD silicon oxide and silicon nitride

Author: Ho Chia-Cheng   Chiou Bi-Shiou  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.42, Iss.3, 2007-02, pp. : 941-947

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