A New Spectrophotometer System for Measuring Hemispherical Reflectance and Normal Emittance of Real Surfaces Simultaneously

Author: Makino Toshiro   Wakabayashi Hidenobu  

Publisher: Springer Publishing Company

ISSN: 0195-928X

Source: International Journal of Thermophysics, Vol.31, Iss.11-12, 2010-12, pp. : 2283-2294

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Abstract

A new spectrophotometer system is developed for the study of thermal radiation characteristics of real surfaces in thermal engineering environments. The system measures spectra of normal incidence hemispherical reflectance R NH and normal emittance $${varepsilon _{rm N}}$$ in the near-ultraviolet through infrared region of wavelength of 0.30 μm to 11 μm simultaneously and repeatedly with a cycle time of 4 s. The system enables evaluation of the normal incidence absorptance A N in this wide spectral region. Transitions of spectra of specular-finished and rough-finished nickel surfaces in a high-temperature air-oxidation process are measured to demonstrate the performance of the system. Clear interference behaviors are found even in the spectra of hemispherical reflectance R NH and emittance $${varepsilon _{rm N}}$$ of a rough-finished surface.

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