Author： Wong Fung Lin Chun-Min Chang Chih-Ping Huang Jun-Rong Yeh Mou-Yung Huang Jiann-Jyh
Publisher： Springer Publishing Company
ISSN： 0272-4324
Source： Plasma Chemistry and Plasma Processing, Vol.26, Iss.6, 2006-12, pp. : 585-595
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