Author: Morent Rino Geyter Nathalie Vlierberghe Sandra Vanderleyden Els Dubruel Peter Leys Christophe Schacht Etienne
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.29, Iss.2, 2009-04, pp. : 103-117
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