Author： Chiang M.-H. Liao K.-C. Lin I.-M. Lu C.-C. Huang H.-Y. Kuo C.-L. Wu J.-S. Hsu C.-C. Chen S.-H.
Publisher： Springer Publishing Company
ISSN： 0272-4324
Source： Plasma Chemistry and Plasma Processing, Vol.30, Iss.5, 2010-10, pp. : 553-563
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
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