A comparative study of different thick photoresists for MEMS applications

Author: Koukharenko E.   Kraft M.   Ensell G.   Hollinshead N.  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.16, Iss.11-12, 2005-11, pp. : 741-747

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Abstract