Thermal stability of uniform silver clusters prepared on oxidized silicon and aluminum surfaces by electron beam lithography in oxidizing and reducing ambients

Author： Yang M.X.   Jacobs P.W.   Yoon C.   Muray L.   Anderson E.   Attwood D.   Somorjai G.A.  

Publisher： Springer Publishing Company

ISSN： 1011-372X

Source： Catalysis Letters, Vol.45, Iss.1-2, 1997-04, pp. : 5-13

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