Effect of a Deprotection Group on Acrylic Photoresist

Author: Fu S.C.   Hsieh K.H.   Wang L.A.  

Publisher: Springer Publishing Company

ISSN: 1022-9760

Source: Journal of Polymer Research, Vol.6, Iss.2, 1999-04, pp. : 99-105

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract