Radio Frequency Plasma Processing to Produce Chromium Sputter Targets

Author: Müller M.   Heimann R.B.   Gitzhofer F.   Boulos M.I.   Schwarz K.  

Publisher: Springer Publishing Company

ISSN: 1059-9630

Source: Journal of Thermal Spray Technology, Vol.9, Iss.4, 2000-12, pp. : 488-493

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Abstract