Author： Javernick D. Edwards G. Chidambaram P.
Publisher： Springer Publishing Company
ISSN： 1543-1940
Source： Metallurgical and Materials Transactions A, Vol.29, Iss.1, 1998-01, pp. : 327-337
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Chemical vapor deposition (CVD) of titanium onto the surface of alumina substrates was used to improve the wetting by molten aluminum prior to infiltration. The CVD titanium coatings on alumina substrates were characterized by X-ray diffraction and energy-dispersive X-ray spectroscopy (EDS) as dual-phase, elemental titanium and titanium aluminide, Ti3Al. The kinetics of the coating process were quantified and analyzed using established reaction kinetics models. An overall activation energy of 219 kJ/mole was calculated for the formation of the titanium coatings on planar alumina substrates, for the temperature range of 610 °C to 870 °C. The CVD-coated planar and porous alumina substrates were immersed in molten aluminum, and wetting of planar substrates and infiltration of porous bodies were documented. Formation of both aluminum-rich and titanium-rich reaction products was observed through EDS cross-sectional analysis.
Related content
Access to resources
Recommend
