Influence of Deposition Rate and Intermediate Layer on Crystal Structure of Pb(Zr,Ti)O3 Thin Films Prepared by RF Sputtering

Author: Mochizuki Shoichi   Thomas Reji   Mihara Toshiyuki   Ishida Tadashi  

Publisher: Taylor & Francis Ltd

ISSN: 0015-0193

Source: Ferroelectrics, Vol.271, Iss.1, 2002-01, pp. : 271-276

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Abstract