Author: Konieczna B. Biedrzycki K. Janus H. W. Markowski L.
Publisher: Taylor & Francis Ltd
ISSN: 0015-0193
Source: Ferroelectrics, Vol.417, Iss.1, 2011-01, pp. : 33-40
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Vanadium carbide films produced by plasma-assisted metal-organic chemical vapour deposition
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
Plasma-Assisted Deposition at Atmospheric Pressure
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :