

Author: GUANGLONG YU JILIANG ZHU QINGLEI ZHANG JUNZE TAN YUNFEI TIAN JIANGUO ZHU DINGQUAN XIAO
Publisher: Taylor & Francis Ltd
ISSN: 1058-4587
Source: Integrated Ferroelectrics, Vol.78, Iss.1, 2006-11, pp. : 93-101
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Abstract
PbTiO 3 thin films were prepared by RF magnetron sputtering with Ar gas, and the average growth rate was measured as 0.185 nm per minute by Scanning Electron Microscopy (SEM) measurement. PbTiO 3 extra thin films at their early stages were deposited under same conditions with different deposition time as 1 min, 3 min and 6 min respectively; and the obtained extra thin films were observed by Atom Force Microscopy (AFM). The experimental results show that at their initial stages, PbTiO 3 extra thin films grow through the formation and the diffusion of unit cells on the surface and the films grow with island mode. With the deposition time increasing, the size and the height of the islands increase and the number of islands decreases. The analysis of cross-view of the films sputtered for 1 min with AFM indicates that the height of islands is nearly 0.4 nm, and with increasing of the deposition time to 3 min and 6 min, the height of the islands increases with the integral time of the length of the PbTiO 3 crystal unit cell. These results confirm further that the films grow through the diffusion of unit cells on the surface with island mode.
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