An E.S.R. study of the radical formed on electron irradiation of mesitylene adsorbed in a molecular sieve

Author: Helcké G.A.   Fantechi R.  

Publisher: Taylor & Francis Ltd

ISSN: 1362-3028

Source: Molecular Physics, Vol.17, Iss.1, 1969-01, pp. : 65-74

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Abstract