Mass spectrometric study of low-pressure inductively coupled plasma for chemical vapor deposition of cubic boron nitride films

Publisher: IOP Publishing

ISSN: 1468-6996

Source: Science and Technology of Advanced Materials, Vol.4, Iss.6, 2003-11, pp. : 115-118

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract