A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)

Publisher： IOP Publishing

ISSN： 1757-899X

Source： IOP Conference Series: Materials Science and Engineering, Vol.39, Iss.1, 2012-09, pp. : 32-40

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Plasma self-organisation in High Power Impulse Magnetron Sputtering Discharges

By  

IOP Conference Series: Materials Science and Engineering, Vol. 39, Iss. 1, 2012-09 ,pp. : 67-72

IOP Publishing

Access to resources Recommend Favorite

Influence of Substrate Temperature on Deposition Rate and Optical Properties of Aluminum Oxide Thin Films Prepared by Reactive DC Sputtering Technique

By  

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 281-284

Trans Tech Publications

Access to resources Recommend Favorite

Sputtering targets: A technology and market analysis

By Rittner Mindy  

JOM, Vol. 52, Iss. 3, 2000-03 ,pp. : 22-23

Springer Publishing Company

Access to resources Recommend Favorite

Microtool coatings using magnetron sputtering

By Yang S C   Cooke K   Aramcharoen A   Mativenga P   Teer D  

Materials Technology: Advanced Performance Materials, Vol. 26, Iss. 1, 2011-02 ,pp. : 20-24

Maney Publishing

Access to resources Recommend Favorite

Negative effects of reactive sputtering in an industrial plasma nitriding

By Roliński E.   Sharp G.   Arner J.  

Journal of Materials Engineering and Performance, Vol. 14, Iss. 3, 2005-06 ,pp. : 343-350

Springer Publishing Company

Access to resources Recommend Favorite