Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen

ISSN： 1367-2630

Source： New Journal of Physics, Vol.10, Iss.5, 2008-05, pp. : 524-540

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen

New Journal of Physics, Vol. 10, Iss. 9, 2008-09 ,pp. : 326-352

IOP Publishing

Access to resources Recommend Favorite

A CRITICAL COMPILATION OF ATOMIC OSCILLATOR STRENGTHS FOR CARBON, NITROGEN AND OXYGEN IONS

Le Journal de Physique IV, Vol. 01, Iss. C1, 1991-03 ,pp. : C1-203-C1-208

Edp Sciences

Access to resources Recommend Favorite

Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar+ ions and water vapor

Journal of Physics: Conference Series , Vol. 100, Iss. 6, 2008-03 ,pp. : 54-57

IOP Publishing

Access to resources Recommend Favorite

A COMPARISON OF ELECTRONIC SPUTTERING INDUCED BY MOLECULAR AND ATOMIC IONS

Le Journal de Physique Colloques, Vol. 50, Iss. C2, 1989-02 ,pp. : C2-15-C2-20

Edp Sciences

Access to resources Recommend Favorite

Interaction of atomic hydrogen with carbon grains

EAS Publications Series, Vol. 46, Iss. issue, 2011-03 ,pp. : 393-398

Edp Sciences

Access to resources Recommend Favorite