In situ study through electrical resistance of growth rate of trifluoroacetate-based solution-derived YBa2Cu3O7 films

Publisher: IOP Publishing

E-ISSN: 1361-6668|28|2|24006-24016

ISSN: 0953-2048

Source: Superconductor Science and Technology, Vol.28, Iss.2, 2015-02, pp. : 24006-24016

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