Controlled Doping of Large‐Area Trilayer MoS2 with Molecular Reductants and Oxidants

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-4095|27|7|1175-1181

ISSN： 0935-9648

Source： ADVANCED MATERIALS, Vol.27, Iss.7, 2015-02, pp. : 1175-1181

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