Nano-Scale Analysis Using Synchrotron-Radiation: Applications in the Semiconductor Industry

Publisher： Bentham Science Publishers

E-ISSN： 1875-6786|4|3|256-266

ISSN： 1573-4137

Source： Current Nanoscience, Vol.4, Iss.3, 2008-08, pp. : 256-266

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Development of Nano-Scale DNA Computing Devices

By  

Current Nanoscience, Vol. 1, Iss. 1, 2005-01 ,pp. : 89-93

Bentham Science Publishers

Access to resources Recommend Favorite

Electron Transfer and Nano-Scale Motions in Nitrogenase Fe-Protein

By  

Current Nanoscience, Vol. 2, Iss. 1, 2006-01 ,pp. : 33-41

Bentham Science Publishers

Access to resources Recommend Favorite

Challenges for the Modern Science in its Descend Towards Nano Scale

By  

Current Nanoscience, Vol. 5, Iss. 3, 2009-08 ,pp. : 372-389

Bentham Science Publishers

Access to resources Recommend Favorite

Pioneering and continuing contributions to the semiconductor industry. The Franklin Institute's 2002 Bower Award for business leadership presented to Gordon E. Moore

By Corporation I.  

Journal of The Franklin Institute, Vol. 340, Iss. 3, 2003-05 ,pp. : 243-247

Elsevier

Access to resources Recommend Favorite

Template-free Fabrication of Nano-sized Cu2O Hollow Spheres, Sheets and Octahedrons in Cu-citrate System and their Morphology-dependent Semiconductor Type

By  

Current Nanoscience, Vol. 8, Iss. 3, 2012-06 ,pp. : 417-423

Bentham Science Publishers

Access to resources Recommend Favorite