Recent Patents on Fabrication of Nanowires

E-ISSN： 2212-4020|1|1|11-20

ISSN： 1872-2105

Source： Recent Patents on Nanotechnology, Vol.1, Iss.1, 2007-02, pp. : 11-20

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Nanowires are the building blocks of future nanodevices and thus methods for fabricating nanowires of various materials in various forms are fundamentally important. Although nanowires have been intensively studied, there are only a few methods that showed promising characteristics for practical applications. Here, we intend to review those patents, which enable nanowire growth to be more controllable and feasible for applications. Various methods for fabricating metal, semiconductor and organic nanowires with promising features are reviewed, where some emphasize the characteristics of individual nanowires, others address the uniformity and alignment of an array of nanowires as a whole. The patents for fabricating nanowires of various materials are introduced in the first part. In the second part, the patents to improve crystalline quality, morphology, uniformity of nanowires are introduced. Finally, the patents for growing aligned nanowire arrays and aligning dispersed nanowires are reviewed.