Development of a novel wafer-probe for in situ measurements of thin film properties

Author: Otell Z el   Marinov D   Šamara V   Bowden M D   de Marneffe J-F   Verdonck P   Braithwaite N St J  

Publisher: IOP Publishing

E-ISSN: 1361-6595|24|3|32002-32008

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.24, Iss.3, 2015-06, pp. : 32002-32008

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Abstract