Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes

Author： Dolgov A   Yakushev O   Abrikosov A   Snegirev E   Krivtsun V M   Lee C J   Bijkerk F  

Publisher： IOP Publishing

E-ISSN： 1361-6595|24|3|35003-35009

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.24, Iss.3, 2015-06, pp. : 35003-35009

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