Stacked and nanolaminated Al2O3/TiO2 for surface passivation and encapsulation of silicon

Publisher: John Wiley & Sons Inc

E-ISSN: 1862-6270|9|6|344-347

ISSN: 1862-6254

Source: PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol.9, Iss.6, 2015-06, pp. : 344-347

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Abstract