The Influence of H2 Plasma Treatment on LWR Mitigation: The Importance of EUV Photoresist Composition

E-ISSN： 1612-8869|12|7|624-641

ISSN： 1612-8850

Source： PLASMA PROCESSES AND POLYMERS (ELECTRONIC), Vol.12, Iss.7, 2015-07, pp. : 624-641

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