Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

Author： Zhi-Hao Wang   Wen Liu   Qiang Zuo   Lei Wang   Yan-Li Zhao   Zhi-Mou Xu  

Publisher： IOP Publishing

ISSN： 0256-307X

Source： Chinese Physics Letters, Vol.31, Iss.8, 2014-08, pp. : 88102-88104

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