Diffusion of As ions and self-diffusion in silicon during implantation

Author： Demakov K.   Starostin V.   Shemardov S.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.47, Iss.10, 2002-10, pp. : 1333-1336

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