A comparative study of the atomic hydrogen penetration into thin vanadium films and silicon oxide-gallium arsenide structures

Author： Bozhkov V.   Kagadei V.   Proskurovskii D.   Romas’ L.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.26, Iss.10, 2000-10, pp. : 926-928

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