Comparison of the annealing behavior of thin Ta films deposited onto Si and SiO2 substrates

Author： Hübner R.   Hecker M.   Mattern N.   Hoffmann V.   Wetzig K.   Engelmann H.-J.   Zschech E.  

Publisher： Springer Publishing Company

ISSN： 1618-2642

Source： Analytical and Bioanalytical Chemistry, Vol.379, Iss.4, 2004-06, pp. : 568-575

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