Charging of submicron structures during silicon dioxide etching in one- and two-frequency gas discharges

Author： Palov A.   Mankelevich Yu.   Rakhimova T.   Shamiryan D.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-780X

Source： Plasma Physics Reports, Vol.36, Iss.10, 2010-10, pp. : 891-901

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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