Integration of High‐k Oxide on MoS2 by Using Ozone Pretreatment for High‐Performance MoS2 Top‐Gated Transistor with Thickness‐Dependent Carrier Scattering Investigation

Publisher： John Wiley & Sons Inc

E-ISSN： 1613-6829|11|44|5932-5938

ISSN： 1613-6810

Source： SMALL, Vol.11, Iss.44, 2015-11, pp. : 5932-5938

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Interface Engineering for High‐Performance Top‐Gated MoS2 Field‐Effect Transistors

By  

ADVANCED MATERIALS, Vol. 26, Iss. 36, 2014-09 ,pp. : 6255-6261

John Wiley & Sons Inc

Access to resources Recommend Favorite

Three‐Dimensional Multilayer Assemblies of MoS2/Reduced Graphene Oxide for High‐Performance Lithium Ion Batteries

By  

PARTICLE & PARTICLE SYSTEMS CHARACTERIZATION (ELECTRONIC), Vol. 32, Iss. 4, 2015-04 ,pp. : 489-497

John Wiley & Sons Inc

Access to resources Recommend Favorite

Stabilizing MoS2 Nanosheets through SnO2 Nanocrystal Decoration for High‐Performance Gas Sensing in Air

By  

SMALL, Vol. 11, Iss. 19, 2015-05 ,pp. : 2305-2313

John Wiley & Sons Inc

Access to resources Recommend Favorite

Sodium‐Ion Batteries: An Advanced MoS2/Carbon Anode for High‐Performance Sodium‐Ion Batteries (Small 4/2015)

By  

SMALL, Vol. 11, Iss. 4, 2015-01 ,pp. : 472-472

John Wiley & Sons Inc

Access to resources Recommend Favorite

An Advanced MoS2/Carbon Anode for High‐Performance Sodium‐Ion Batteries

By  

SMALL, Vol. 11, Iss. 4, 2015-01 ,pp. : 473-481

John Wiley & Sons Inc

Access to resources Recommend Favorite