The effect of surface reactions of O, O3 and N on film properties during the growth of silica-like films

Author: Rügner K   Reuter R   von Keudell A   Benedikt J  

Publisher: IOP Publishing

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.47, Iss.22, 2014-06, pp. : 224005-224013

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content