Author： Lee Chris G N Kanarik Keren J Gottscho Richard A
Publisher： IOP Publishing
ISSN： 0022-3727
Source： Journal of Physics D: Applied Physics, Vol.47, Iss.27, 2014-07, pp. : 273001-273009
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Pulsed plasma etching for semiconductor manufacturing
Journal of Physics D: Applied Physics, Vol. 47, Iss. 30, 2014-07 ,pp. :
Access to resources
Recommend
Journal of Magnetohydrodynamics, Plasma, and Space Research, Vol. , Iss. , 2016-04 ,pp. :
Grand challenges of inertial fusion energy
Journal of Physics: Conference Series , Vol. 244, Iss. 1, 2010-08 ,pp. :
Access to resources
Plasma physics : ion energy in RF plasma etching
Journal de Physique Lettres, Vol. 40, Iss. 11, 1979-06 ,pp. :
Target manufacturing – A “grand challenge" for inertial fusion
Le Journal de Physique IV, Vol. 133, Iss. issue, 2006-06 ,pp. :