Fabricating GeO2 passivation layer by N2O plasma oxidation for Ge NMOSFETs application

Author: Meng Lin   Xia An   Ming Li   Quan-Xin Yun   Min Li   Zhi-Qiang Li   Peng-Qiang Liu   Xing Zhang   Ru Huang  

Publisher: IOP Publishing

ISSN: 1674-1056

Source: Chinese Physics B, Vol.23, Iss.6, 2014-06, pp. : 67701-67704

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