Sulfur-doped black silicon formed by metal-assist chemical etching and ion implanting

Author: Liu Kong   Qu Shengchun   Zhang Xinhui   Tan Furui   Bi Yu   Lu Shudi   Wang Zhanguo  

Publisher: Springer Publishing Company

ISSN: 0947-8396

Source: Applied Physics A, Vol.114, Iss.3, 2014-03, pp. : 765-768

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